The Photography Master Retreat, July 9-16, 2016. South of France.
THE PHOTOGRAPHY MASTER RETREAT 2016 will be held from Sunday July 9-16, 201 in The South of France. Applications are due by November 15, 2015 at the latest.
A one-week retreat for professional photographers/artists seeking to refocus their personal/professional work under the guidance of four distinguished mentors.
Four internationally acclaimed mentors will guide, advise and inspire 16 participants who submit applications. Less a shooting trip than an opportunity to pause and reflect, it is a career-enhancing opportunity for professional critique and artistic introspection.
Less a shooting trip than an opportunity to pause and reflect, the retreat emphasizes intensive looking and discussion about the participants’ process and work. Whether you are a professional or consider yourself an artist, whether you are a fine artist or a documentarian, the important element is that you be committed to personal, creative work and be passionate about taking it to the next level.
It is conceived in the spirit of a retreat, with a select group of 16 attendees, who will live and work with each other and their mentors on the estate of La Bastide d’Esparon in the beautiful mountainous hamlet of Esparon in the South of France. It is designed as a journey to explore photographic ideas and process in depth, allowing participants to re-think their trajectory as an artist.
During this week-long retreat, photographers with an established body of personal work (fine art, conceptual, or documentary) have the opportunity to examine their practice under the guidance of distinguished mentors with daily one-on-one and group exchanges. Portfolio reviews, supportive critique, discussions, shooting exercises and opportunities for introspection are integral parts of the program.
The Photography Master Retreat is the beginning of a new course of action, a path to better and more conscious work. A retreat is: a refuge, a safe place, a hideaway, a haven. ?A retreat is mostly conceived as the beginning of a journey, a change from the usual or expected path, a definite time spent away from one’s normal life for the purpose of reflecting and reconnecting with one’s work at a higher level.
The distinguished Mentors are: Elisabeth Biondi: Visuals Editor and Independent Curator, Katharina Bosse, Artist and Professor, Martine Fougeron: Artist and Professor, Lyle Rexer: Critic, Curator and Educator.
The selection committee will review and contact the selected applicants by December 15, 2016.
The fee is $3,200 and includes all accommodations and meals for the week. Airfare and transportation are not included. The dates of July 11 to 18, 2015 have been chosen so that participants may attend the nearby Rencontres d’Arles Photo Festival, if they wish, the week before from July 4 to 9, 2015.
For more information and the application: http://thephotographymasterretreat.com
For questions, contact Martine Fougeron: application@ThePhotographyMasterRetreat.com